Alumina Ceramic Robotic Arm For Wafer Manufacturing

Alumina Ceramic Robotic Arm for Precision Wafer Manufacturing Product Overview Puwei's Alumina Ceramic Robotic Arm sets the benchmark for reliability and precision in semiconductor automation. Engineered specifically for demanding cleanroom environments in wafer manufacturing, it delivers contamination-free operation, micron-level positioning accuracy, and exceptional longevity where performance is non-negotiable. Its inherent properties make it indispensable for handling sensitive components in advanced Microelectronics Packaging and Integrated Circuit production lines. High-precision Alumina Ceramic Robotic Arm engineered for cleanroom wafer handling. Technical Specifications Material Composition Base Material: High-Purity Alumina Ceramic (Al₂O₃). Alumina Content: ≥ 95% (Standard), ≥ 99.6% (High-Purity). Mohs Hardness: 9. Density: 3.8-3.9 g/cm³. Surface Finish: Ra ≤ 0.2 μm (Mirror finish available). Thermal Properties Thermal Expansion Coefficient: 6-8 × 10⁻⁶/°C. Thermal Condu…

Alumina Ceramic Robotic Arm Alumina Ceramic Structural Components 99.6 Alumina Ceramic Substrate 96 Alumina Ceramic Substrate AlN Ceramic Substrate