Alumina Ceramic Robotic Arm For Wafer Manufacturing

Alumina Ceramic Robotic Arm for Precision Wafer Manufacturing Puwei's advanced Alumina Ceramic Robotic Arm represents the gold standard in semiconductor automation components. Engineered specifically for wafer manufacturing environments, this high-precision robotic arm delivers unmatched performance in cleanroom applications where contamination control, positioning accuracy, and reliability are critical. Technical Specifications Material Composition Base Material: High-Purity Alumina Ceramic (Al₂O₃) Alumina Content: ≥ 95% (Standard), ≥ 99.6% (High-Purity) Mohs Hardness: 9 (Excellent scratch and wear resistance) Density: 3.8-3.9 g/cm³ Surface Finish: Ra ≤ 0.2 μm (Mirror finish available) Thermal Properties Thermal Expansion Coefficient: 6-8 × 10⁻⁶/°C Thermal Conductivity: 15-30 W/(m·K) Maximum Operating Temperature: 1500°C Thermal Shock Resistance: Excellent Electrical & Mechanical Properties Volume Resistivity: >10¹⁴ Ω·cm Dielectric Strength: 15-20 kV/mm Compress…

Alumina Ceramic Robotic Arm Alumina Ceramic Structural Components 99.6 Alumina Ceramic Substrate 96 Alumina Ceramic Substrate AlN Ceramic Substrate